Penggunaan Aqua Regia Dan HCL Sebagai Larutan Pelindian Pada Proses
Efficiency in refining process of Metallurgy Grade Silicon (MG-Si) using HNO3+3HCl (aqua regia) and HCl have been investigated. The purification process was using a leaching mechanisme with various pH = 1, pH = 2 and pH = 3 followed by heating at 100 °C for 9 hours and subsequently each sample was rinsed by distilled water every 3 hours. The target …
